Plasma processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11094509
APP PUB NO 20180068835A1
SERIAL NO

15437040

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The features of the present invention are that a plasma processing apparatus includes: a process chamber in which a sample is plasma-processed; a dielectric window which airtightly seals an upper part of the process chamber; an inductive antenna which is disposed at an upper part of the dielectric window and forms an induction magnetic field; a radio frequency power source which supplies radio frequency power to the inductive antenna; and a Faraday shield to which radio frequency power is supplied from the radio frequency power source and which is disposed between the dielectric window and the inductive antenna, and the plasma processing apparatus further includes a monitoring unit which monitors a current flowing in the Faraday shield and a control unit which controls the monitored current.

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Patent Owner(s)

  • HITACHI HIGH-TECH CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ichino, Takamasa Tokyo, JP 23 981
Kawaguchi, Tadayoshi Tokyo, JP 15 625
Satake, Makoto Tokyo, JP 29 135
Yokogawa, Kenetsu Tokyo, JP 100 1897

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