POLYAMIDE-IMIDE, RAW MATERIAL SALT OF POLYAMIDE-IMIDE, AND PRODUCTION METHOD THEREOF

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United States of America Patent

SERIAL NO

15564678

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Abstract

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The present invention is to provide a polyamide-imide which has a high regularity of molecular structure and few branched structures, does not contain hydrogen halide, is not required to be separated and purified in post processes, and can be suitably used as a film, a varnish, or a molding material; raw material salt of polyamide-imide and production method thereof.

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Patent Owner(s)

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UNITIKA LTD4-1-3 KYUTARO-MACHI CHUO-KU OSAKA-SHI OSAKA 541-8566

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
FUKUBAYASHI, Yumeto Uji-shi, Kyoto, JP 5 1
NAKAI, Makoto Uji-shi, Kyoto, JP 20 119
SHIGETA, Akira Uji-shi, Kyoto, JP 30 149
YAMADA, Munenori Uji-shi, Kyoto, JP 5 2

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