Resist composition, method for forming resist pattern, and polyphenol compound used therein

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United States of America Patent

PATENT NO 11480877
APP PUB NO 20180074402A1
SERIAL NO

15560458

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present invention is a compound represented by the following general formula (1).

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Patent Owner(s)

  • MITSUBISHI GAS CHEMICAL COMPANY, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Echigo, Masatoshi Tokyo, JP 132 598
Sato, Takashi Kanagawa, JP 951 9277
Shimizu, Youko Kanagawa, JP 5 20
Toida, Takumi Kanagawa, JP 21 58

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