RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
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Mar 28, 2016
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Mar 30, 2015
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Abstract
A radiation-sensitive composition comprising (A) a resist base material, (B) an optically active diazonaphthoquinone compound, and (C) a solvent, wherein
- in the radiation-sensitive composition, the content of a solid component is 1 to 80% by mass, the content of the solvent is 20 to 99% by mass, andthe resist base material (A) is a compound represented by the formula (1):
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