METHODS OF FORMING PATTERNS USING NANOIMPRINT LITHOGRAPHY
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United States of America Patent
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Mar 21, 2017
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Sep 12, 2016
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Abstract
A method of forming patterns is provided. The method includes forming a resist layer on a substrate, imprinting transfer patterns of a template on the resist layer, performing an alignment operation to correct a position of the substrate or the template, increasing a viscosity of the resist layer while the alignment operation is performed, and curing the resist layer after the alignment operation terminates.
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