TREATMENT COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND CLEANING METHOD

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United States of America Patent

SERIAL NO

15563076

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Abstract

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A treatment composition for chemical mechanical polishing includes: (A) a water-soluble amine; (B) a water-soluble polymer having an aromatic hydrocarbon group-containing repeating unit; and an aqueous medium. The treatment composition for chemical mechanical polishing preferably further includes (C) an organic acid having an aromatic hydrocarbon group and has a pH of 9 or more.

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Patent Owner(s)

Patent OwnerAddress
JSR CORPORATION9-2 HIGASHI-SHINBASHI 1-CHOME MINATO-KU TOKYO 105-8640

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HAYAMA, Takahiro Minato-ku, JP 16 50
IIDA, Masashi Minato-ku, JP 15 103
KAMEI, Yasutaka Minato-ku, JP 10 19
KAMO, Satoshi Minato-ku, JP 19 69
MITSUBOSHI, Ran Minato-ku, JP 6 60
MITSUMOTO, Kiyotaka Minato-ku, JP 5 13
NISHIGUCHI, Naoki Minato-ku, JP 89 763

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