Plasma processing apparatus and plasma processing method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10734203
APP PUB NO 20180096824A1
SERIAL NO

15700600

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Abstract

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A plasma processing apparatus comprises a base including an electrode body having a seat surface for setting a substrate held on a conveying carrier, and a platform for supporting the electrode body, and a lid configured to be moved up and down relative to the base, wherein the lid is moved down and appressed on the platform to define a closed space and a plasma is generated within the closed space to implement a plasma processing for the substrate set on the seat surface. The substrate is held on the holding sheet and set on the seat surface with the holding sheet therebetween. The plasma processing apparatus further comprises a guide being provided along a circumference of the electrode body for alignment of the frame, and a cover provided with the lid for covering at least the frame of the conveying carrier when the closed space is defined.

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Patent Owner(s)

Patent OwnerAddress
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD22-6 MOTO-MACHI KADOMA-SHI OSAKA 5710057 ?5710057

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hara, Motoko Osaka, JP 10 174
Iwai, Tetsuhiro Osaka, JP 33 653

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