Manufacture method of array substrate and array substrate manufactured by the method
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United States of America Patent
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Feb 19, 2019
Grant Date -
Apr 5, 2018
app pub date -
Apr 8, 2016
filing date -
Mar 1, 2016
priority date (Note) -
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status (Latency Note)
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Abstract
The present invention provides a manufacture method of an array substrate and an array substrate manufactured by the method. By sequentially forming the first passivation layer and the flat layer, and then implementing patterning process and anneal process to the flat layer, in the anneal process to the flat layer, the flat layer and the source/the drain cannot contact with each other due to the first passivation layer inbetween, and thus, no reaction of generating complex happens, which is beneficial for promoting the electrical property of the array substrate and realizing the signal conduction; in comparison with prior art, the present invention can decrease at least one mask in advance, which is a advantage to raise the process result, to decrease the process time and to reduce the production cost. In the array substrate, the signal transmission is smooth, and the substrate possesses the great electrical property.
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