TEMPLATE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

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United States of America Patent

SERIAL NO

15849739

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Abstract

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According to one embodiment, a template forming method is provided. In the template forming method, a template pattern is formed on a first surface of a substrate. A high liquid repellent property portion is formed in a region different from the template pattern on a side of the first surface of the substrate. The high liquid repellent property portion has a higher contacting angle with respect to a resist than a portion without the high liquid repellent property portion formed therein.

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Patent Owner(s)

Patent OwnerAddress
TOSHIBA MEMORY CORPORATION1-1 SHIBAURA 1-CHOME MINATO-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hatano, Masayuki Yokohama Kanagawa, JP 53 397
Komatsu, Yohko Kawasaki Kanagawa, JP 6 15
Nakasugi, Tetsuro Yokohama Kanagawa, JP 67 622
Tsuji, Masatoshi Kawasaki Kanagawa, JP 32 231

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