A COSMETIC SUBSTRATE AND A COSMETIC CONTAINING THE COSMETIC SUBSTRATE

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United States of America Patent

SERIAL NO

15572410

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Abstract

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A cosmetic substrate composed of a silylated amino acid/silane compound copolymer obtained by poly-condensing at least one silylated amino acid having a specific chemical structure and at least one silane compound having a specific chemical structure, wherein the reaction molar ratio of silylated amino acid:silane compound is in the range of 1:5 to 1:150, and a cosmetic containing 0.01% by mass or more and 20% by mass or less of the cosmetic substrate are provided.

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Patent Owner(s)

Patent OwnerAddress
SEIWA KASEI COMPANY LIMITED1-2-14 NUNOICHI-CHO HIGASHIOSAKA-SHI OSAKA 5798004 ?5798004

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HOMMA, Yuta Higashiosaka-shi, JP 4 14
TOMIHISA, Shota Higashiosaka-shi, JP 2 0
YOSHIOKA, Masato Higashiosaka-shi, JP 54 379

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