PROCESS FOR OBTAINING HIGH-PERIOD, THICK ORDERED FILMS COMPRISING A BLOCK COPOLYMER
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United States of America Patent
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Jan 21, 2016
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Jan 21, 2015
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Abstract
The present invention relates to a process for obtaining high-period (typically >10 nm), thick (typically >20 nm) ordered films on a nanometric scale comprising a block copolymer (BCP). The invention also relates to the compositions used to obtain these thick ordered films and to the resulting ordered films that can be used in particular as masks in the lithography field.
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