SYSTEMS AND METHODS FOR PROVIDING SHUNT CANCELLATION OF PARASITIC COMPONENTS IN A PLASMA REACTOR

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United States of America Patent

SERIAL NO

15382409

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Abstract

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Systems and methods for negating an impedance associated with parasitic capacitance are described. One of the systems includes a plasma chamber having a housing. The housing includes a pedestal, a showerhead situated above the pedestal to face the pedestal, and a ceiling located above the showerhead. The system further includes a radio frequency (RF) transmission line coupled to the plasma chamber for transferring a modified RF signal to the showerhead. The system includes a shunt circuit coupled within a pre-determined distance from the ceiling. The shunt circuit is coupled to the RF transmission line for negating the impedance associated with the parasitic capacitance within the housing.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Augustyniak, Edward Tualatin, US 36 781
Kapoor, Sunil Vancouver, US 52 212
Rangineni, Yaswanth Beaverton, US 23 104
Sakiyama, Yukinori West Linn, US 32 153

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