Substrate processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11674225
APP PUB NO 20180195173A1
SERIAL NO

15862190

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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There is provided a substrate processing apparatus for performing film formation by supplying a processing gas to a substrate, including: a rotary table provided in a processing container; a mounting stand provided to mount the substrate and configured to be revolved by rotating the rotary table; a processing gas supply part configured to supply a processing gas to a region through which the mounting stand passes by the rotation of the rotary table; a rotation shaft rotatably provided in a portion rotating together with the rotary table and configured to support the mounting stand; a driven gear provided on the rotation shaft; a driving gear provided along an entire circumference of a revolution trajectory of the driven gear to face the revolution trajectory of the driven gear and configured to constitute a magnetic gear mechanism with the driven gear; and a rotating mechanism configured to rotate the driving gear.

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Patent Owner(s)

  • TOKYO ELECTRON LIMTED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Honma, Manabu Oshu, JP 83 5410
Kato, Hitoshi Oshu, JP 326 7458
Kobayashi, Takeshi Oshu, JP 285 3234
Ohizumi, Yukio Oshu, JP 9 132

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