Diagnostic Methods for the Classifiers and the Defects Captured by Optical Tools
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United States of America Patent
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Dec 7, 2017
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Jan 10, 2017
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Abstract
Wafer inspection with stable nuisance rates and defect of interest capture rates are disclosed. This technique can be used for discovery of newly appearing defects that occur during the manufacturing process. Based on a first wafer, defects of interest are identified based on the classified filtered inspection results. For each remaining wafer, the defect classifier is updated and defects of interest in the next wafer are identified based on the classified filtered inspection results.
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