Thin-film devices and fabrication
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United States of America Patent
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Oct 13, 2020
Grant Date -
Sep 13, 2018
app pub date -
Dec 24, 2015
filing date -
Dec 12, 2011
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.
First Claim
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International Classification(s)
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- C03B:MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR ....
- B23K:SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLA....
- E06B:FIXED OR MOVABLE CLOSURES FOR OPENINGS IN BUILDING....
- H01B:CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATER....
- G02F:DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF ....
- B32B:LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA....
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