FILM FORMATION APPARATUS AND FILM FORMATION METHOD
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United States of America Patent
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Oct 18, 2018
app pub date -
Sep 22, 2014
filing date -
Sep 22, 2014
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Abstract
A film formation apparatus is configured so as to be equipped with: a film-forming chamber for forming a thin film using plasma on a substrate at a film formation position; an abnormal discharge-detecting section for detecting an abnormal discharge of the plasma; an imaging device for imaging abnormal plasma, which is the plasma when an abnormal discharge is detected, or an abnormal substrate surface, which is the substrate surface on which a thin film is formed when an abnormal discharge is detected; and a storage unit for storing the images taken by the imaging device.
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