Film forming method and film forming apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10864548
APP PUB NO 20180311700A1
SERIAL NO

15960885

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Abstract

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A step of constantly supplying first and second carrier gases into a processing container having a substrate therein through first and second carrier gas flow paths, respectively, and supplying a source gas into the processing container through a source gas flow path, a step of purging the source gas by supplying a purge gas into the processing container through a purge gas flow path provided separately from the carrier gas, a step of supplying a reactant gas into the processing container through a reactant gas flow path, and a step of purging the reactant gas by supplying a purge gas into the processing container through the purge gas flow path are performed in a predetermined cycle. An additive gas having a predetermined function is supplied as at least a part of the purge gas in at least one of the purging steps.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDAKASAKA BIZ TOWER 3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 107-6325

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ashizawa, Hiroaki Yamanashi, JP 31 332
Fujii, Yasushi Yamanashi, JP 58 634
Hong, Seokhyoung Yamanashi, JP 16 66
Kamio, Takashi Yamanashi, JP 23 94
Nakamura, Hideo Yamanashi, JP 240 3519
Nunoshige, Yu Yamanashi, JP 10 328
Takahashi, Tsuyoshi Yamanashi, JP 198 3130
Yamazaki, Kazuyoshi Yamanashi, JP 75 163

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