PROCESS MONITORING DEVICE
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United States of America Patent
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Issued Date -
Nov 1, 2018
app pub date -
Oct 19, 2016
filing date -
Oct 19, 2015
priority date (Note) -
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status (Latency Note)
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Abstract
A process chamber measurement wafer for location inside a process chamber and measuring environmental conditions within the process chamber during a process run. The process chamber measurement wafer including a releasable dummy wafer to protect the instrumented portion of the process chamber measurement wafer from process material deposited during the process run.
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