Chemical liquid discharge mechanism, liquid processing apparatus, chemical liquid discharge method, and storage medium

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United States of America Patent

PATENT NO 10755952
APP PUB NO 20180350633A1
SERIAL NO

16059265

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Abstract

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Disclosed is a chemical liquid discharge mechanism. The mechanism includes: a storage portion including a chemical liquid storage space; a diluent supply port opened to supply a diluent for reducing a viscosity of the chemical liquid to the storage space; a vertex flow forming portion that forms vortex flows in the diluent and the chemical liquid by supplying a fluid to the storage space to stir the diluent and the chemical liquid; and a liquid discharge port opened to an upper side of the diluent supply port in the storage space such that, by the supply of the diluent, the diluent and the chemical liquid flow into the liquid discharge port to be discharged from the storage space. Thus, the viscosity of the waste liquid discharged from the liquid discharge port may be reduced, and thus, it is not necessary to largely set the inclination of the liquid discharge path.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDMINATO-KU TOKYO 107-6325

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hamada, Masahito Kumamoto, JP 11 87
Inada, Hiroichi Kumamoto, JP 31 566
Sasagawa, Norihiko Kumamoto, JP 5 16

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