ETCHANT COMPOSITION AND FORMING METHOD OF WIRING USING ETCHANT COMPOSITION

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United States of America Patent

APP PUB NO 20180371625A1
SERIAL NO

15970980

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Abstract

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A phosphoric acid-free etchant composition and a method of forming a wiring, the composition including about 40 wt % to about 60 wt % of an organic acid compound; about 6 wt % to about 12 wt % of a glycol compound; about 1 wt % to about 10 wt % of nitric acid, sulfuric acid, or hydrochloric acid; about 1 wt % to about 10 wt % of a nitrate salt compound; and water, all wt % being based on a total weight of the phosphoric acid-free etchant composition.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG DISPLAY CO LTDGYEONGGI-DO 17113

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KIM, Jin Seock Yongin-si, KR 13 22
KIM, Sang-woo Seongnam-si, KR 158 1538
LEE, Bong Won Yongin-si, KR 31 991
LEE, Dae-woo Seoul, KR 72 573
PARK, Il-Ryong Gimcheon-si, KR 3 3
PARK, Jong Hee Yongin-si, KR 22 26
WON, Bong-Yeon Gimpo-si, KR 3 2

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