PHOTOMASK AND METHOD FOR MANUFACTURING ACTIVE SWITCH ARRAY SUBSTRATE USING SAME
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Jan 10, 2019
app pub date -
May 31, 2017
filing date -
May 31, 2017
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
This application relates to a photomask and a method for manufacturing an active switch array substrate using same. The photomask includes: a light penetration region, including a light penetration substrate; a translucent region, disposed on the light penetration substrate and formed of chromium or a chromium compound; a light shielding region, disposed on the light penetration substrate; and reflective material layers of a plurality of fine lines, disposed between the translucent region and the light shielding region and formed of chromium or a chromium compound, where the light penetration rate of the photomask is regulated according to doping and a distribution density of a low reflective material, so that the light penetration rate of the translucent region is lower than the light penetration rate of the light transmitting region and is higher than the light penetration rate of the light shielding region.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully