POROUS MATERIAL FOR POLISHING AND POLISHING TOOL HAVING THE SAME

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United States of America Patent

APP PUB NO 20190047121A1
SERIAL NO

16079332

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Abstract

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An object of the present invention is to provide a porous material for polishing in which, during a polishing operation, it is possible to keep a proportion between abrasive grains in contact with an object to be polished and a resin portion in contact with the object to be polished within a certain range, even if an unskilled person attaches a polishing tool to an automated device and uses it, there is no need for complicated adjustment to stabilize the device, whereby it is possible to obtain precise surface accuracy. The above object is achieved by a porous material for polishing including an elastic foam having anisotropy, a polymer, and abrasive grains.

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Patent Owner(s)

Patent OwnerAddress
XEBEC TECHNOLOGY CO LTDTOKYO 102-0083

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
FUJIWARA, Norimasa Tokyo, JP 5 16
MURAI, Keiichi Tokyo, JP 49 1008

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