Plasma Reactor Having Radial Struts for Substrate Support
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United States of America Patent
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Issued Date -
Mar 21, 2019
app pub date -
Nov 19, 2018
filing date -
Nov 19, 2018
priority date (Note) -
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Abstract
A plasma reactor for processing a workpiece includes a reactor chamber having a ceiling and a sidewall and a workpiece support facing the ceiling and defining a processing region, and a pair of concentric independently excited RF coil antennas overlying the ceiling and a side RF coil concentric with the side wall and facing the side wall below the ceiling, and being excited independently.
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