DIRECT EXPOSURE MACHINE WITHOUT MASK

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20190129309A1
SERIAL NO

16177032

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The present invention provides a direct exposure machine without mask, comprising a stage device and an exposure device. The stage device supports an exposed substrate, a surface of which coats with a sensitive layer. The exposure device shifts relatively to the stage device and includes a first exposure module. The first exposure module includes a light source, a penetrating scanner and multi-focus lenses. The light source outputs multiple beams arranged parallel to each other. The penetrating scanner includes a multifaceted prism driven to rotate, which has multiple facets. Each beam goes into one facet and out from the other to the sensitive layer of the exposed substrate. The multi-focus lenses are disposed between the light source and the multifaceted prism for focusing the beams to the substrate to be exposed.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
SHUZ TUNG MACHINERY INDUSTRIAL CO LTDNO 30 HOUKE S RD HOULI DIST TAICHUNG CITY 42152

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHANG, MING-HUNG TAICHUNG CITY, TW 43 148
HUNG, KUO-SHU TAICHUNG CITY, TW 14 57
LIAO, SHU-CHENG TAICHUNG CITY, TW 2 0
LIU, CHUN-HSIEN TAICHUNG CITY, TW 28 133

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation