Pattern forming method for quartz surface and pattern forming device for quartz surface
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United States of America Patent
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Feb 2, 2021
Grant Date -
May 16, 2019
app pub date -
Nov 15, 2017
filing date -
Nov 15, 2017
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Abstract
The present application relates to a pattern forming method for quartz surface and a pattern forming device for quartz surface. According to the pattern forming method for quartz surface of the present application, by comprising a step of forming a pattern and a step of forming a color, it is possible to freely express the color on the pattern simultaneously along with forming the pattern on the quartz surface. And, in addition to these steps, by optionally comprising a step of additionally forming a pattern, it is possible to freely form a desired pattern on the quartz surface, and, by adding long line type patterns on the quartz surface unlike existing conventional quartz surfaces, it is possible to produce the quartz surface showing patterns and textures which are more natural and close to natural stone.
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