COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME

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Jun 20, 2019
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Dec 12, 2018
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Dec 15, 2017

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Abstract

The present invention provides a composition for etching a silicon nitride film and a manufacturing method of a semiconductor device using the same, wherein the composition for etching a silicon nitride film comprises phosphoric acid, metaphosphoric acid, an ammonium salt-based compound, and water.

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SOULBRAIN CO LTD	GYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor Name	Address	# of filed Patents	Total Citations
LEE, Jin Uk	Seongnam-si, KR	94	398
LIM, Jung Hun	Seongnam-si, KR	36	109
PARK, Jae Wan	Seongnam-si, KR	69	487

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COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America Patent

16217049

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16217049

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