Fully Compensated Synthetic Ferromagnet for Spintronics Applications

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United States of America Patent

APP PUB NO 20190189911A1
SERIAL NO

16278766

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Abstract

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A laminated seed layer stack with a smooth top surface having a peak to peak roughness of 0.5 nm is formed by sequentially sputter depositing a first seed layer, a first amorphous layer, a second seed layer, and a second amorphous layer where each seed layer may be Mg and has a resputtering rate 2 to 30X that of the amorphous layers that are TaN, SiN, or a CoFeM alloy. A template layer that is NiCr or NiFeCr is formed on the second amorphous layer. As a result, perpendicular magnetic anisotropy in an overlying magnetic layer that is a reference layer, free layer, or dipole layer is substantially maintained during high temperature processing up to 400° C. and is advantageous for magnetic tunnel junctions in embedded MRAMs, spintronic devices, or in read head sensors. The laminated seed layer stack may include a bottommost Ta or TaN buffer layer.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACUTING COMPANY LTDHSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jan, Guenole San Jose, US 115 2395
Lee, Yuan-Jen Fremont, US 60 403
Liu, Huanlong Sunnyvale, US 46 424
Tong, Ru-Ying Los Gatos, US 180 4623
Wang, Po-Kang Los Altos, US 133 2361
Zhu, Jian San Jose, US 156 533

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