MAKE UP KIT COMPRISING A BASE COMPOSITION RESISTANT TO MAKE- UP REMOVAL
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United States of America Patent
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Issued Date -
Aug 1, 2019
app pub date -
Feb 4, 2019
filing date -
Feb 4, 2019
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Abstract
The present invention relates to a kit for make-up and/or care of nails and/or false nails, comprising:
- a composition C1 for make-up and/or care of nails and/or false nails comprising at least one film-forming polymer, said polymer being insoluble in acetone, methyl acetate, and ethyl acetate, anda make-up removal composition C2 comprising at least one volatile solvent S2 selected from the group consisting of C2-C5 alcohols, C5-C12 alkanes, and mixtures thereof, said solvent S2 being able to solubilize the film-forming polymer of composition C1.
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