Anisotropic etching using highly branched polymers

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United States of America Patent

PATENT NO 11071210
APP PUB NO 20190239357A1
SERIAL NO

16246799

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Abstract

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An etching composition for etching an electrically conductive layer structure for forming a conductor track is provided. The etching composition includes an etchant, a highly branched compound and optionally a solvent. In addition, a method of etching an electrically conductive layer structure, a conductor track, an arrangement of at least two conductor tracks, and a component carrier are provided.

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Patent Owner(s)

Patent OwnerAddress
AT & S AUSTRIA TECHNOLOGIE & SYSTEMTECHNIK AKTIENGESELLSCHAFT8700 LEOBEN-HINTERBERG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Klocek, Jolanta Leoben, AT 3 1
Krivec, Thomas Zeltweg, AT 19 71

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