COMPOSITION AND METHOD FOR TREATING SEMICONDUCTOR SURFACE

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United States of America Patent

APP PUB NO 20190284436A1
SERIAL NO

16353130

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Abstract

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A composition for treating a surface of semiconductor is provided by (A) a polymer having a polymer chain having a repeating unit represented by the following Formula (1); and (B) a chelating agent having a molecular weight of 500 or less:

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Patent Owner(s)

Patent OwnerAddress
JSR CORPORATION9-2 HIGASHI-SHINBASHI 1-CHOME MINATO-KU TOKYO 105-8640

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
MITSUMOTO, Kiyotaka Minato-ku, JP 5 14
MIURA, Takuya Minato-ku, JP 32 52
NARUSE, Hidenori Minato-ku, JP 8 53

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