Processing apparatus for forming a coating film on a substrate having a camera and a mirror member

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United States of America Patent

PATENT NO 11791162
APP PUB NO 20190287796A1
SERIAL NO

16433069

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A processing method in one embodiment includes: a step that takes an image of the end face of a reference substrate, whose warp amount is known, over the whole periphery thereof using a camera to obtain shape data of the end face of the reference substrate; a step that takes an image of the end face of a substrate over the whole periphery thereof using a camera to obtain shape data of the end face of the substrate; a step that calculates warp amount of the substrate based on the obtained shape data; a step that forms a resist film on a surface of the substrate; a step that determines the supply position from which an organic solvent is to be supplied to a peripheral portion of the resist film and dissolves the peripheral portion by the solvent supplied from the supply position to remove the same from the substrate.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nishiyama, Tadashi Koshi, JP 84 448
Noda, Yasuaki Koshi, JP 12 51

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