Cleaning liquid supplying system, substrate processing apparatus and substrate processing system
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United States of America Patent
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Aug 17, 2021
Grant Date -
Oct 10, 2019
app pub date -
Apr 2, 2019
filing date -
Apr 5, 2018
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
According to one embodiment, provided is a cleaning liquid supplying system including: a circulation line in which cleaning liquid flows, first end of the circulation line being connected to a supply port of a cleaning liquid supplying apparatus, second end of the circulation line being connected to a collection port of the cleaning liquid supplying apparatus; a branch pipe branched from the circulation line and connected to a substrate cleaning unit; a valve provided on the branch pipe and configured to control supply of cleaning liquid from the circulation line to the substrate cleaning unit; and a flow rate adjuster configured to adjust a flow rate of the cleaning liquid flowing in the circulation line.
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