Method for the Open-Loop and/or Closed-Loop Control of the Gas Thoroughput in the Baking Chamber of a Baking Device
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United States of America Patent
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Issued Date -
Oct 17, 2019
app pub date -
Dec 13, 2017
filing date -
Dec 15, 2016
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Abstract
Method for controlling gas flow rate in a baking device chamber having a chain of baking tongs moving along a path therethrough, including controlled introduction of a fuel volume flow, optional controlled introduction of a convection air volume flow, and controlled removal of a suction volume flow. A volume balance of the volume flow introduced into, the expanding volume flow expanding inside, and the volume flow removed by suction from the baking chamber is determined for controlling the suction volume flow and/or the convection air volume flow. The power(s) of a suction fan and/or convection fan is/are controlled in such a manner that the volume flow removed by suction is greater than or equal to the sum of the introduced volume flow and the expanding volume flow expanding inside the baking chamber so that the introduced volume flow and the expanding volume flow expanding inside the baking chamber are removed via the suction fan.
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