DEPOSITION MASK
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United States of America Patent
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Issued Date -
Oct 24, 2019
app pub date -
Oct 24, 2017
filing date -
Nov 18, 2016
priority date (Note) -
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Abstract
A deposition mask includes a first surface facing to the deposition target substrate, and a second surface opposite to the first surface. The deposition mask includes: an effective area in which a plurality of through holes are formed and a longitudinal direction in which one or more of the effective areas are arranged along the longitudinal direction. At least in a central area of the longitudinal direction, the deposition mask is warped to be convex on the first surface in a cross section orthogonal to the longitudinal direction.
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