Apparatus for stressing semiconductor substrates

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United States of America Patent

PATENT NO 11764071
APP PUB NO 20190333778A1
SERIAL NO

16437988

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Abstract

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Apparatus for use in preparing heterostructures having a reduced concentration of defects including apparatus for stressing semiconductor substrates to allow them to conform to a crystal having a different crystal lattice constant.

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Patent Owner(s)

  • GLOBALWAFERS CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Albrecht, Peter D O'Fallon, US 21 318
Falster, Robert J London, GB 88 917
Pitney, John A O'Fallon, US 19 842
Voronkov, Vladimir V Merano, IT 23 317

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