METHOD FOR PRODUCING VAPOR DEPOSITION MASK, AND METHOD FOR PRODUCING ORGANIC SEMICONDUCTOR ELEMENT

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United States of America

SERIAL NO

16532911

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Abstract

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A method for producing a vapor deposition mask capable of satisfying both enhancement in definition and reduction in weight even when a size is increased, and a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition are provided. A vapor deposition mask is produced by the steps of preparing a metal plate with a resin layer in which a resin layer is provided on one surface of a metal plate, forming a metal mask with a resin layer by forming a slit that penetrates through only the metal plate, for the metal plate in the metal plate with a resin layer, and thereafter, forming a resin mask by forming openings corresponding to a pattern to be produced by vapor deposition in a plurality of rows lengthwise and crosswise in the resin layer by emitting a laser from the metal mask side.

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Patent Owner(s)

Patent OwnerAddress
DAI NIPPON PRINTING CO LTDJAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
NISHIMURA, Hiroyuki Tokyo, JP 143 1478
OBATA, Katsunari Tokyo, JP 64 435
TAKEDA, Toshihiko Tokyo, JP 176 2668

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