SLURRY AND POLISHING METHOD

United States of America

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Jan 16, 2020
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Sep 12, 2017
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Sep 12, 2017

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Abstract

A slurry comprises abrasive grains, a glycol, and water, wherein an average particle diameter of the abrasive grains is 120 nm or smaller, and a pH is 4.0 or higher and lower than 8.0. A polishing method comprises a step of polishing a metal by use of the slurry.

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RESONAC CORPORATION	TOKYO

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Inventor Name	Address	# of filed Patents	Total Citations
OOUCHI, Mayumi	Chiyoda-ku, Tokyo, JP	1	1

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SLURRY AND POLISHING METHOD

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United States of America

16334807

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