HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

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United States of America

APP PUB NO 20200017678A1
SERIAL NO

16455942

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Abstract

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A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a polymer that includes a substituted biphenylene structural unit, wherein one phenylene of the biphenylene of the substituted biphenylene structural unit is substituted with at least one of a hydroxy-substituted C6 to C30 aryl group, and a hydroxy-substituted C3 to C30 heteroaryl group.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG SDI CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KIM, Seunghyun Suwon-si, KR 59 252
KIM, Sunghwan Suwon-si, KR 141 510
LIM, Jaebum Suwon-si, KR 6 2
PARK, Yushin Suwon-si, KR 10 2
YANG, Sunyoung Suwon-si, KR 6 2

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