COMPOSITION FOR SURFACE TREATMENT, METHOD FOR PRODUCING THE SAME, SURFACE TREATMENT METHOD USING COMPOSITION FOR SURFACE TREATMENT, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200017719A1
SERIAL NO

16491102

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Abstract

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An object of the present invention is to provide a means for sufficiently removing residues remaining on a surface of a polished object to be polished.

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Patent Owner(s)

Patent OwnerAddress
FUJIMI INCORPORATEDKIYOSU-SHI AICHI 452-8502

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ISHIDA, Yasuto Kiyosu-shi, Aichi, JP 21 59
ONISHI, Shogo Kiyosu-shi, Aichi, JP 42 88
YOSHINO, Tsutomu Kiyosu-shi, Aichi, JP 49 537
YOSHIZAKI, Yukinobu Kiyosu-shi, Aichi, JP 28 87

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