COMPOSITION FOR CLEANING MASK AND METHOD FOR CLEANING MASK USING THE SAME

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United States of America

APP PUB NO 20200017978A1
SERIAL NO

16195800

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Abstract

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The present invention provides a composition for cleaning a mask comprising a) 0.2 to 10% by weight of two or more alkali compounds selected from alkali hydroxides and alkali carbonates, b) 0.1 to 8% by weight of nitrate, c) 1 to 8% by weight of an oxidizer, and d) residual water, wherein the pH is 11.5 to 14.

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Patent Owner(s)

Patent OwnerAddress
SOULBRAIN CO LTD34 PANGYO-RO 255BEON-GIL BUNDANG-GU SEONGNAM-SI GYEONGGI-DO 13486

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
AN, Sang-Ho Seongnam-si, KR 16 280
KIM, Hong Sik Seongnam-si, KR 34 919
LEE, Chang Ho Seongnam-si, KR 143 906
LEE, Gil Ho Seongnam-si, KR 11 66
PARK, Soon Min Seongnam-si, KR 1 0

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