PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, INSULATING FILM, AND ELECTRONIC COMPONENT

United States of America

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Jan 16, 2020
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Mar 12, 2018
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Mar 12, 2018

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Abstract

A photosensitive resin composition contains an alkali-soluble polyimide (a), an unsaturated bond-containing compound (b), a heat-crosslinkable compound (c), and a photopolymerization initiator (d) having a structure represented by the following general formula (1):

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Patent Owner(s)

Patent Owner	Address
TORAY INDUSTRIES INC	JAPAN

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G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
KANAMORI, Daisuke	Shiga, JP	8	15
KATSURADA, Yuki	Shiga, JP	3	0

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PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION FILM, INSULATING FILM, AND ELECTRONIC COMPONENT

Number of patents in Portfolio can not be more than 2000

United States of America

16494670

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16494670

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