CURED FILM-FORMING COMPOSITION

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200019061A1
SERIAL NO

16334898

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Abstract

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This cured film-forming resin composition is characterized in comprising: as a component (A), a polymer containing a structural unit derived from a first monomer having the structure with formula (1); a photoacid generator as a component (B); fine particles as a component (C); and a solvent (in the formula, R1 represents hydrogen or a methyl group and R2 represents an organic group capable of undergoing elimination with the oxygen atom bonded thereto). The cured film-forming resin composition forms a cured film that has solvent resistance to organic solvents and a high liquid repellency (lyophobicity) wherein the lyophilicity/lyophobicity can be easily varied using small ultraviolet exposure doses and the lyophilic areas have a high lyophilicity even for high surface tension liquids.

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Patent Owner(s)

Patent OwnerAddress
NISSAN CHEMICAL CORPORATIONTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HOSHINO, Yuki Funabashi, JP 30 112
YUKAWA, Shojiro Funabashi, JP 17 47

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