OPTICAL ASSEMBLY FOR GUIDING AN OUTPUT BEAM OF A FREE ELECTRON LASER
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United States of America
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Jan 16, 2020
app pub date -
Sep 23, 2019
filing date -
Sep 23, 2019
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Abstract
An optical assembly guides an output beam of a free electron laser to a downstream illumination-optical assembly of an EUV projection exposure apparatus. The optical assembly has first and a second GI mirrors, each with a structured reflection surface to be impinged upon by the output beam. A first angle of incidence on the first GI mirror is between one mrd and 10 mrad. A maximum first scattering angle is produced, amounting to between 50% and 100% of the first angle of incidence. A second angle of incidence on the second GI mirror is at least twice as large as the first angle of incidence. A maximum second scattering angle of the output beam amounts to between 30% and 100% of the second angle of incidence. The two planes of incidence on the two GI mirrors include an angle with respect to one another that is greater than 45°.
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