CHAMBER CLEANING PROCESS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200020512A1
SERIAL NO

16035431

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Abstract

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A method and apparatus for obtaining at least one normalized baseline spectrum for a processing volume of a processing chamber; calculating a distribution value of the normalized baseline spectrum; obtaining a plurality of normalized cleaning process spectrums; calculating a distribution function of the plurality of normalized cleaning process spectrums; comparing the distribution value to the distribution function; and determining an end point by identifying when the distribution function approaches the distribution value. A method includes: initiating a cleaning process in a processing chamber, flowing a cleaning gas into a processing volume of the processing chamber; obtaining a normalized baseline spectrum; measuring a plurality of intensity spectrums; calculate a plurality of normalized cleaning process spectrums; comparing a distribution value of the normalized baseline spectrum to a distribution function of the plurality of normalized cleaning process spectrums; and determining an end point by identifying when the distribution function approaches the distribution value.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHANG, Max Santa Clara, US 2 22
CHEN, Weiting Taipei City, TW 5 2
CHOI, Young-Jin San Jose, US 52 312
PAN, Christy Santa Clara, US 1 0
PARK, Beom Soo San Jose, US 89 2529
YANG, Lynn Santa Clara, US 1 0

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