PLASMA GENERATOR, CLEANING LIQUID PROCESSING APPARATUS, SEMICONDUCTOR DEVICE CLEANING APPARATUS, CLEANING LIQUID PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200020551A1
SERIAL NO

16421473

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Abstract

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A plasma generator, a cleaning liquid processing apparatus including the same, a semiconductor cleaning apparatus, and a cleaning liquid processing method are provided. The cleaning liquid processing apparatus comprising a bubble formation section configured to lower a pressure of a mixed liquid obtained by mixing a liquid and a gas to form bubbles in the mixed liquid, a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the mixed liquid, a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid, and a discharge nozzle connected to the mixing section and configured to discharge the mixed liquid to a wafer.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HAN, Kyu Hee Seongnam-si, KR 7 57
JANG, Won Hyuk Seoul, KR 7 34
KIM, Min Hyoung Seoul, KR 2 0
NAM, Sang Ki Seongnam-si, KR 37 244
SIQING, Lu Seongnam-si, KR 1 0
YOO, Beom Jin Hwaseong-si, KR 3 0

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