PLASMA GENERATOR, CLEANING LIQUID PROCESSING APPARATUS, SEMICONDUCTOR DEVICE CLEANING APPARATUS, CLEANING LIQUID PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
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United States of America
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Issued Date -
Jan 16, 2020
app pub date -
May 24, 2019
filing date -
May 24, 2019
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Abstract
A plasma generator, a cleaning liquid processing apparatus including the same, a semiconductor cleaning apparatus, and a cleaning liquid processing method are provided. The cleaning liquid processing apparatus comprising a bubble formation section configured to lower a pressure of a mixed liquid obtained by mixing a liquid and a gas to form bubbles in the mixed liquid, a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the mixed liquid, a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid, and a discharge nozzle connected to the mixing section and configured to discharge the mixed liquid to a wafer.
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