ETCHANT COMPOSITION AND METHOD OF MANUFACTURING WIRING SUBSTRATE USING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200024516A1
SERIAL NO

16505712

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Abstract

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An etchant composition may include: a peroxosulfate; a cyclic amine compound; a first amphoteric compound including a carboxyl group; and a second amphoteric compound including a sulfone group, wherein the second amphoteric compound may be different from the first amphoteric compound.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG DISPLAY CO LTDYONGIN-SI GYEONGGI-DO 17113
DONGWOO FINE-CHEM CO LTD(SINHEUNG-DONG) 132 YAKCHON-RO IKSAN-SI JEOLLABUK-DO 54631 54631

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Shin Hyuk Suwon-si, KR 2 64
Kim, Beom Soo Seoul, KR 11 38
KIM, Bong Kyun Hwaseong-si, KR 20 107
Kim, Jin Suek Daejeon, KR 13 24
Kim, Sang Tae Iksan-si, KR 43 110
Kim, Seung Hee Asan-si, KR 26 42
Kuk, In Seol Jeonju-si, KR 3 4
Lee, Dong Hee Hwaseong-si, KR 116 492
Lim, Dae Sung Jeonju-si, KR 7 80
Park, Young Chul Cheonan-si, KR 34 73
Shim, Seung Bo Asan-si, KR 32 36
Yoon, Young Jin Jeonju-si, KR 19 76

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