PLASMA GENERATION DEVICE

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200029413A1
SERIAL NO

16495154

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A plasma generation device including an electric power supply device to supply electric power to multiple electrodes arranged in a reaction chamber; a processing gas supply device to supply a processing gas to the reaction chamber; and a control device to control operation of the electric power supply device and the processing gas supply device in either of a first operation mode in which, when a stop signal is received while electric power is being supplied to the electrodes in a state with the processing gas being supplied to the reaction chamber, supply of electric power to the electrodes is stopped and supply of the processing gas to the reaction chamber is stopped, and a second operation mode in which supply of electric power to the electrodes is stopped, but the processing gas continues to be supplied to the reaction chamber.

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Patent Owner(s)

  • FUJI CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KUSAKA, Wataru Okazaki-shi, JP 2 0

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