SYSTEMS AND METHODS FOR SUCTION PAD ASSEMBLIES

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200043814A1
SERIAL NO

16518213

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Abstract

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In an embodiment, a system includes: a pad comprising a first side and a second side opposite the first side, wherein the first side is configured to receive a wafer during chemical mechanical planarization (CMP), and a platen adjacent the pad along the second side, wherein the platen comprises a suction opening that interfaces with the second side; a pump configured to produce suction at the suction opening to adhere the second side to the platen; and a sensor configured to collect sensor data characterizing a uniformity of adherence between the pad and the platen, wherein the pump is configured to produce the suction at the suction opening based on the sensor data.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTDHSINCHU

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHAO, Yu-Hsiang Taipei City, TW 8 19
LEI, Chi-Ping Hsin-Chu, TW 2 0

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