RETICLE CLEANING SYSTEM AND METHOD FOR USING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200057367A1
SERIAL NO

16172075

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Abstract

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A method for cleaning a reticle includes rotating the reticle, providing a cleaning liquid to clean the reticle, detecting a static charge value on the reticle during rotating the reticle, and reducing static charges on the reticle in response to the detected static charge value. Hence, the electrostatic discharge (ESD) occurred to the reticle can be prevented.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING CO LTDHSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHENG, Wei-Chang Taichung City, TW 10 1
LIAO, Chi-Hung New Taipei City, TW 131 196

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