Importance

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Abstract

A plasma apparatus includes a remote plasma source, a substrate processing chamber, and a connector which connects the remote plasma source to the substrate processing chamber. The remote plasma source includes a continuous peripheral wall structure that surrounds an inner channel, and that includes an electrode structure that defines at least a part of an internal channel extending internally within the continuous peripheral wall structure in which the inductively coupled plasma can be sustained. The remote plasma source also includes an electrical signal supply device for supplying an electrical signal that drives the electrode structure, and a plasma outlet which is in communication with the internal channel. The connector is in connection with the plasma outlet of the remote plasma source and the substrate processing chamber so that at least some components of the inductively coupled plasma sustained in the internal channel can be introduced to the substrate processing chamber.

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First Claim